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VPI High Vacuum Magnetron Sputtering System Installed in the Shared Laboratory of the School of Physics and Astronomy, Shanghai Jiao Tong University

Founded in 2004, VPI (Vision Precision Instruments) has spent the past two decades building a legacy of trust and excellence in the global vacuum coating industry. From world-leading research institutions to cutting-edge technology companies, users around the world continue to achieve breakthroughs with the help of VPI’s precision coating systems. This enduring pursuit of excellence reflects VPI’s brand philosophy — “Only for the Best.” For twenty years, VPI has crafted every instrument with precision and passion, committed to delivering a better experience and superior results for every customer.

Recently, a team of application engineers from VPI visited the Shared Laboratory of Shanghai Jiao Tong University. The purpose of this visit was to gain insights into the real-world performance of the SD-650 series high-vacuum magnetron sputtering systems, to collect feedback and suggestions from users, and to strengthen long-term collaboration with academic research teams.

When imaging the microscopic world with a scanning electron microscope (SEM), sample preparation is a decisive factor for image quality. Among the tools working behind the scenes, the sputter coater plays a crucial role. By depositing an ultrathin metallic coating on a specimen, it improves conductivity and optimizes imaging. This article explains what a sputter coater is, why it matters in electron microscopy (EM) sample preparation, and where it is commonly used.

Specifications such as “DC 1000 W” or “RF 300 W” represent the rated maximum output of the power supply. However, whether such levels can be sustained in practice depends on target size, cooling performance, and material properties.

SD-650MH High-Vacuum Magnetron Sputtering Titanium Coating – Technical Application Case Study

Physical Vapor Deposition (PVD) is a technique that involves converting material into a vapor phase and depositing it as a thin film in a high vacuum environment, also known as vacuum coating.

Can magnetron sputtering also deposit organic polymers such as polyimide? Drawing on an internal trial by VPI’s R&D team, this case study analyses—in five sections—how the SD-650MH high-vacuum magnetron sputtering system performs when polyimide is used as the target material. The discussion highlights the equipment’s strengths in low-power plasma ignition, high-vacuum stability and precise thickness control, together with its adaptability to sensitive targets and its operator-friendly design.

Are There Affordable Alternative Sputtering Targets to Gold?(Substitution strategies for low-vacuum coaters amid soaring gold prices)

Application Case – Battery Materials Laboratory
VPI SD-900M Magnetron Sputter Coater (Sample Preparation)

Magnetron sputtering is a plasma-assisted physical-vapor-deposition (PVD) technique in which energetic ions bombard a solid target, ejecting atoms or molecules that subsequently condense on a substrate to form a film. The resulting coatings are dense and adhere strongly, making the process particularly suitable for refractory metals, alloys, and compound materials. Precise control of film thickness allows the method to meet the stringent density and uniformity requirements of optical and electronic functional layers. Because of its outstanding film quality and controllability, magnetron sputtering has become a key fabrication route for high-performance coatings—such as optical dielectrics and transparent conductors—in photonics and materials-science research.

🌟 Happy Labor Day! A tribute to every dedicated professional on the front lines of research. May every experiment you conduct lead to breakthroughs!

Battery Storage Industry Trend: Composite Films & Density Engineering
The ongoing “battery revolution” in lithium ion, solid state, sodium ion and other chemistries is driven by the relentless pursuit of higher energy density, longer cycle life and enhanced safety. Achieving these goals hinges on the development of novel materials, where high quality thin film electrodes and functional coatings play a pivotal role.
• Composite thin films built on electrode surfaces can stabilise interfaces and suppress side reactions, thereby extending service life.
• Researchers are likewise optimising material density: introducing nanoporous structures or lightweight phases to lower overall electrode mass while preserving active material efficacy. This strategy promises a higher specific energy (Wh kg⁻¹) — critical for portable and aerospace applications — yet it also poses challenges such as diminished film strength or adhesion, demanding advanced deposition technology to balance weight with structural integrity.

Customized vacuum coating solutions successfully overcome adhesion issues, film oxidation discoloration, and thickness non-uniformity in thick film preparation

As a leading high-tech enterprise specializing in vacuum coating and materials science equipment, Vision Precision Instruments (VPI) has introduced the SD-650 series high vacuum magnetron sputtering systems, providing strong momentum for advanced energy materials research and development.

Magnetron sputtering and thermal evaporation are both widely used physical vapor deposition (PVD) techniques for thin-film coating. Although both methods can coat similar materials (such as carbon targets for sputtering and carbon rods for evaporation), each has unique strengths in semiconductor and optical applications. Here, we compare these two techniques using Vision Precision Instruments’ VPI SD-650MH magnetron sputter coater and SD-100AF high-vacuum thermal evaporator to help you determine the best approach for your specific requirements.

Electron microscopes (EM) are crucial tools for exploring micro/nano structures. To ensure high-resolution and clear images of samples under various types of electron microscopes, conductive thin films must be prepared on the sample surface. The choice and preparation of the target materials for the film directly affect imaging quality. Therefore, understanding the characteristics and suitable applications of different materials (targets) is essential.

In high vacuum sputtering coating equipment (VPI 650MH series sputtering coater), controlling gas flow is crucial for the stability of the sputtering process. Common gas flow control devices include Electromagnetic Flow Valve (Em) and Mass Flow Controller (MFC). They have different working principles and application scenarios, so how should you choose?

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