VPI Dual-Target, Dual-RF High-Vacuum Sputter Coater Installed at Great Bay University: Supporting Research in Polarization Imaging and Exciton Dynamics

Recently, VPI completed the installation, commissioning, and on-site training of an SD-650MH dual-target, dual-RF high-vacuum magnetron sputter coater for the Polarization Imaging and Exciton Dynamics Laboratory, Room A420, School of Physical Sciences, Great Bay University. The system has now been successfully installed in the laboratory and will provide a stable, flexible, and reproducible PVD thin-film deposition platform for research areas including optoelectronic materials, semiconductor thin films, two-dimensional material devices, dielectric films, and functional thin-film sample preparation.

From unpacking and equipment positioning to vacuum system connection, gas-line and water-cooling integration, dual-RF power supply commissioning, and operator training, the VPI engineering team completed a full delivery process tailored to the laboratory’s practical research requirements. The system adopts a compact benchtop platform design and integrates a high-vacuum chamber, dual-target sputtering configuration, dual RF power supplies, flow control, touchscreen operation interface, and a dedicated cooling unit. It is well suited for university research groups seeking high-quality thin-film preparation within limited laboratory space.

The delivered SD-650MH dual-target, dual-RF configuration is particularly suitable for research environments that require frequent switching between material systems, thin-film structure design, and process parameter exploration. The dual-target design supports independent deposition from two different targets, offering flexibility for multilayer films, composite films, interface engineering, and comparative material studies. The dual-RF power supply configuration further enhances sputtering compatibility with insulating materials, dielectric materials, oxides, nitrides, and semiconductor materials.

For research in polarization imaging, exciton dynamics, photoresponse, and low-dimensional material devices, stable and controllable thin-film preparation is a critical foundation for advancing from material design to device validation.

VPI high-vacuum magnetron sputtering systems are developed for materials science and sample preparation applications, and can be used to prepare a wide range of thin-film materials, including metals, ceramics, semiconductors, and insulators. The high-vacuum environment helps improve deposition stability, while multiple power supply options, including RF and DC configurations, provide greater process flexibility for targets and sample systems with different electrical conductivities. VPI’s SD-650MH series supports single-target, dual-target, or multi-target configurations, and can be applied in research scenarios such as semiconductor electrodes, interconnect layers, ITO conductive films, and advanced optical coatings.

VPI remains focused on the real needs of universities and research institutes for thin-film preparation platforms that are compact, high-vacuum, easy to operate, and scalable. The successful deployment of the SD-650MH dual-target, dual-RF high-vacuum sputter coater at Great Bay University not only demonstrates VPI’s engineering delivery capabilities in research-grade coating equipment, but also further highlights the application value of domestically developed precision instruments in materials science, semiconductor research, and optoelectronic research platform development.

Looking ahead, VPI will continue to support materials science, SEM sample preparation, functional thin-film deposition, and vacuum coating applications by providing universities, research institutions, and industrial R&D laboratories with reliable equipment solutions, process support, and localized service.