Engineer Wei
Jul 24, 2026
Sample preparation is one of the most critical factors affecting SEM image quality and analytical efficiency. The VPI SD-2200M Magnetron Sputter Coater combines a stable vacuum system, precise gas control, a large deposition chamber, and support for multiple target materials to produce uniform conductive coatings of Au, Ag, Pt, Cu, and other metals. It is an ideal solution for large-size SEM sample preparation, surface modification, and thin-film research.
VPI SD-2200M (8-inch Target) Magnetron Sputter Coater for Large-Area SEM Sample Preparation
Sample preparation is one of the most critical factors affecting SEM image quality and analytical efficiency. The VPI SD-2200M Magnetron Sputter Coater combines a stable vacuum system, precise gas control, a large deposition chamber, and support for multiple target materials to produce uniform conductive coatings of Au, Ag, Pt, Cu, and other metals. It is an ideal solution for large-size SEM sample preparation, surface modification, and thin-film research.
A Critical Step Before SEM Analysis
In scanning electron microscopy (SEM), surface characterization, and materials research, sputter coating is far more than an optional procedure—it is a key sample preparation step that directly influences image stability, conductivity, and analytical accuracy.
For non-conductive or poorly conductive samples, a uniform conductive coating effectively minimizes charging effects, improves image resolution, and enhances the reliability of subsequent analyses.
Designed for Everyday Laboratory Applications
The VPI SD-2200M Magnetron Sputter Coater is designed to meet the daily requirements of research laboratories and materials science applications.
Key features include:
Transparent, scratch-resistant quartz chamber for convenient process observation
Compatible with commonly used sputtering targets including Au, Ag, Pt, and Cu
Stable vacuum system combined with precise gas flow control for consistent film deposition
Large chamber designed for coating larger specimens while maintaining coating uniformity
Whether for routine SEM sample preparation or advanced thin-film research, the SD-2200M provides a reliable and efficient coating solution.
Typical Applications
The SD-2200M is well suited for:
Conductive coating for large-size SEM samples
Materials surface modification
Thin-film deposition and research
University teaching and scientific research
Sample preparation in analytical and testing laboratories
Technical Highlights
Chamber Size: Ø350 × 240 mm
Ultimate Vacuum: 2 Pa (within 5 minutes)
Maximum Sputtering Current: 1.6 A
Overall Dimensions: 490 × 400 × 590 mm
Its compact footprint allows convenient installation on laboratory benches or dedicated workstations while providing a spacious chamber for larger specimens.