よくある質問
2025年11月24日
Optimizing Sputtering Technology: How to Enhance Effective Sputtered Area and Sputtering Rate
By optimizing the target-to-sample distance, power, pressure, and other parameters, it is possible to effectively balance sputtering rate and effective sputtered area. For VPI equipment, adjusting these variables based on sample size, quantity, and deposition thickness will lead to more efficient and higher-quality thin film deposition.
2025年11月10日
Northeastern University Installs VPI SD-650MHT Dual-Target High-Vacuum Sputtering System to Advance Materials Science Research
As a mid-to-high-end deposition system designed for materials science applications, the SD-650MHT is well-suited for research in metal surface engineering, functional oxide films, and emerging electronic materials. The system supports both DC and RF sputtering, enabling the deposition of high-quality thin films on a variety of substrates including metals, ceramics, semiconductors, and insulators. It provides critical support for research projects involving conductive layers, dielectric films, and multilayer structures.
2025年10月27日
VPI High Vacuum Magnetron Sputtering System Installed in the Shared Laboratory of the School of Physics and Astronomy, Shanghai Jiao Tong University
VPI High Vacuum Magnetron Sputtering System Installed in the Shared Laboratory of the School of Physics and Astronomy, Shanghai Jiao Tong University
2025年10月13日
20 Years of Dedication — Only for the Best
Founded in 2004, VPI (Vision Precision Instruments) has spent the past two decades building a legacy of trust and excellence in the global vacuum coating industry. From world-leading research institutions to cutting-edge technology companies, users around the world continue to achieve breakthroughs with the help of VPI’s precision coating systems. This enduring pursuit of excellence reflects VPI’s brand philosophy — “Only for the Best.” For twenty years, VPI has crafted every instrument with precision and passion, committed to delivering a better experience and superior results for every customer.
2025年9月28日
Revisiting Shanghai Jiao Tong University Shared Laboratory: Technical Exchange and Service
Recently, a team of application engineers from VPI visited the Shared Laboratory of Shanghai Jiao Tong University. The purpose of this visit was to gain insights into the real-world performance of the SD-650 series high-vacuum magnetron sputtering systems, to collect feedback and suggestions from users, and to strengthen long-term collaboration with academic research teams.
2025年9月15日
Sputter Coaters in Electron‑Microscopy Sample Preparation: The First Step into the Microscopic World
When imaging the microscopic world with a scanning electron microscope (SEM), sample preparation is a decisive factor for image quality. Among the tools working behind the scenes, the sputter coater plays a crucial role. By depositing an ultrathin metallic coating on a specimen, it improves conductivity and optimizes imaging. This article explains what a sputter coater is, why it matters in electron microscopy (EM) sample preparation, and where it is commonly used.
2025年8月25日
Maximum Power Capability and Application Limits of DC and RF Power Supplies in Magnetron Sputtering
Specifications such as “DC 1000 W” or “RF 300 W” represent the rated maximum output of the power supply. However, whether such levels can be sustained in practice depends on target size, cooling performance, and material properties.
2025年7月7日
Case Study: Testing and Analysis of Polyimide Film Deposition with the SD-650MH Series High-Vacuum Magnetron Sputtering System
Can magnetron sputtering also deposit organic polymers such as polyimide? Drawing on an internal trial by VPI’s R&D team, this case study analyses—in five sections—how the SD-650MH high-vacuum magnetron sputtering system performs when polyimide is used as the target material. The discussion highlights the equipment’s strengths in low-power plasma ignition, high-vacuum stability and precise thickness control, together with its adaptability to sensitive targets and its operator-friendly design.
2025年5月19日
Deployment and Application of the SD-650 Series High-Vacuum Magnetron Sputtering Coater at a University – Case Study
Magnetron sputtering is a plasma-assisted physical-vapor-deposition (PVD) technique in which energetic ions bombard a solid target, ejecting atoms or molecules that subsequently condense on a substrate to form a film. The resulting coatings are dense and adhere strongly, making the process particularly suitable for refractory metals, alloys, and compound materials. Precise control of film thickness allows the method to meet the stringent density and uniformity requirements of optical and electronic functional layers. Because of its outstanding film quality and controllability, magnetron sputtering has become a key fabrication route for high-performance coatings—such as optical dielectrics and transparent conductors—in photonics and materials-science research.
2025年5月1日












