Engineer Wei
2026년 5월 8일
The VPI SD-2000III is a low vacuum triple-target rotating magnetron sputtering coater designed for thin film deposition, sample preparation, and surface engineering applications. Equipped with a triple-target rotating structure, the system supports rapid target switching and continuous coating processes, making it suitable for multilayer and composite film deposition.
The VPI SD-2000III is a low vacuum triple-target rotating magnetron sputtering coater designed for thin film deposition, sample preparation, and surface engineering applications. Equipped with a triple-target rotating structure, the system supports rapid target switching and continuous coating processes, making it suitable for multilayer and composite film deposition.
The system provides a stable low-vacuum discharge environment to ensure reliable and uniform coating performance. Its rotating sample stage and optimized magnetron design improve film uniformity and process stability, making it ideal for conductive coating, SEM sample preparation, teaching laboratories, and basic thin film research.
Featuring an intuitive operation interface, flexible parameter adjustment, and compact structural design, the SD-2000III offers convenient operation, reliable performance, and excellent cost-effectiveness for universities, research institutes, and laboratory applications.