VPI - Li
19. Mai 2025
Magnetron sputtering is a plasma-assisted physical-vapor-deposition (PVD) technique in which energetic ions bombard a solid target, ejecting atoms or molecules that subsequently condense on a substrate to form a film. The resulting coatings are dense and adhere strongly, making the process particularly suitable for refractory metals, alloys, and compound materials. Precise control of film thickness allows the method to meet the stringent density and uniformity requirements of optical and electronic functional layers. Because of its outstanding film quality and controllability, magnetron sputtering has become a key fabrication route for high-performance coatings—such as optical dielectrics and transparent conductors—in photonics and materials-science research.
Deployment and Application of the SD-650 Series High-Vacuum Magnetron Sputtering Coater at a University – Case Study
Magnetron sputtering is a plasma-assisted physical-vapor-deposition (PVD) technique in which energetic ions bombard a solid target, ejecting atoms or molecules that subsequently condense on a substrate to form a film. The resulting coatings are dense and adhere strongly, making the process particularly suitable for refractory metals, alloys, and compound materials. Precise control of film thickness allows the method to meet the stringent density and uniformity requirements of optical and electronic functional layers. Because of its outstanding film quality and controllability, magnetron sputtering has become a key fabrication route for high-performance coatings—such as optical dielectrics and transparent conductors—in photonics and materials-science research.
The SD-650 series high-vacuum magnetron sputtering coaters from Vision Precision Instruments (VPI) are advanced systems designed for R&D and small-scale pilot production. Offering an ultimate pressure down to 5 × 10⁻⁵ Pa and fine sputtering-process control, the platform supports single-, dual-, or multi-target configurations to enable stable, precise thin-film deposition. This case study focuses on the real-world deployment of the SD-650MH model at a university, highlighting its value in photonic-device and advanced-materials research and presenting key operating conditions and performance data for the benefit of scientists and engineers in related fields.
About the End User
The user is a well-known university dedicated to photonics and advanced-materials research. To enhance its thin-film fabrication capabilities, the institution installed an SD-650MH high-vacuum magnetron sputtering coater from VPI in 2025. VPI provided end-to-end support—from installation and commissioning to operator training—ensuring rapid, stable start-up. The system now enables high-quality film research for photonic devices and novel functional materials, while also serving as a vital training platform for the next generation of researchers.
System Overview
The compact SD-650MH comprises a sputtering vacuum chamber, magnetron target (gun), substrate holder, pumping group, gas-flow control, vacuum-measurement instrumentation, and an integrated electrical-control system. Its stainless-steel, water-cooled chamber (≈ 210 mm internal diameter) features an acrylic viewport and a standard 50 mm target station (single target standard, upgradable to dual target). Water circulation cools the target, allowing sputtering of conductive and insulating materials—metals, semiconductors, and dielectrics alike.
A vibration-isolated turbo-molecular pump rated at 300 L/s, backed by a mechanical fore-pump, evacuates the chamber from atmosphere to operating pressure (≈ 9 × 10⁻⁴ Pa) in roughly ten minutes; ultimate pressure reaches 5 × 10⁻⁵ Pa. A combined vacuum gauge monitors pressure across the full range. High-purity argon (Ar) serves as the working gas; a precision flow-control manifold (optional mass-flow controller) maintains stable chamber pressure throughout sputtering.
Control is via a fully programmable touch-screen interface, which lets users manage pumping, gas flow, power settings, and more through an intuitive GUI. Built-in automation sequences handle pump-down, gas back-fill, and sputtering in user-defined steps, improving repeatability and safety. The SD-650MH integrates both a constant-current DC power supply for conductive targets and an RF power supply (hundreds of watts, with auto-matching network) for insulating targets such as SiO₂, ensuring stable RF coupling under varying loads. Optional high-precision film-thickness monitors provide real-time rate and thickness data and can automatically terminate deposition at a preset thickness.
Key Operating Conditions and Performance Data
Researchers used the SD-650MH to sputter SiO₂ dielectric films under various conditions to assess system performance. High-purity Ar was the process gas; an RF source powered the SiO₂ target at 20 – 60 W while chamber pressure was held between roughly 1.3 Pa and 2.0 Pa.
At an RF power of ~20 W and ~2.0 Pa, a stable violet glow discharge appeared at the target surface, indicating ignition and the onset of sputtering.
Low-power start-up: 30 W and ~2.0 Pa yielded a deposition rate of ~0.01 Å s⁻¹, limited by lower plasma density and higher pressure.
Power increase & pressure optimization: Raising power to 60 W and reducing pressure to ~1.6 Pa boosted the rate to ~0.02–0.03 Å s⁻¹. Further lowering pressure to ~1.3 Pa at the same 60 W raised the rate to ~0.04 Å s⁻¹.
Extended run: At ~1.5 Pa and 60 W for 30 minutes, the rate climbed with time—~0.07 Å s⁻¹ after 20 minutes and ~0.10 Å s⁻¹ after 30 minutes—as surface cleaning and thermal stabilization enhanced sputter efficiency.
These results demonstrate that the SD-650MH allows effective rate control via RF power and working pressure. Though rates start modestly, optimized parameters and stable long-term operation increase the rate by an order of magnitude, ultimately achieving ~0.10 Å s⁻¹ (0.01 nm s⁻¹), suitable for high-quality dielectric films.
Application Areas
With the SD-650MH, researchers can pursue thin-film studies across multiple cutting-edge domains:
Photonic devices – High-quality optical dielectrics and transparent conductors (e.g., ITO, AZO) for displays, lasers, and photovoltaics. The system produces dense, uniform films and antireflection or filter coatings essential for device performance.
Functional thin-film materials – Magnetic, ferroelectric/piezoelectric, superconducting, and compound-semiconductor films for sensors, memory, energy, and other advanced applications. Precise parameter control yields dense, uniform layers meeting stringent research requirements.
Surface modification – Hard, wear-resistant alloys or diamond-like carbon (DLC) for mechanical parts, and bioactive ceramic coatings for implants. The SD-650MH offers stable, controllable processes for performance-enhancing surface layers.
Stable, reliable performance – Designed for long, uninterrupted runs and frequent cycling with consistent results.
High automation and ease of use – Intelligent touch-screen control and programmable sequences reduce workload and errors; multi-level interlocks ensure safety, letting even beginners operate confidently.
Modular expandability – Upgrade from single to dual targets, add secondary gas lines for reactive sputtering, integrate film-thickness monitors, substrate heaters, or bias supplies to meet evolving research needs.
Broad applicability – Compact footprint and low running costs suit standard labs, yet performance approaches industrial systems—ideal for universities, institutes, and innovative materials enterprises in both fundamental studies and pilot-scale validation.
The successful deployment of the SD-650MH high-vacuum magnetron sputtering coater at this university confirms its practical value in research. Combining strong performance, flexible configuration, and user-friendly operation, it meets the demand for high-quality thin films in academic labs and bridges the gap to pilot-stage production. This case suggests the SD-650 series will play an increasingly important role in accelerating photonic-device and functional-film technologies at research institutes and innovation-driven companies worldwide.