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SD-650MH High-Vacuum Magnetron Sputtering Platform Completes Installation and Training, Delivering Flexible and Reliable Experimental Thin-Film Preparation Capabilities for Functional Films, Semiconductors, and Optoelectronic Materials

From Sample Preparation to Thin-Film Research: VPI Coating Solutions

The VPI SD-650MH High-Vacuum Dual-Target Dual-RF Sputter Coater is equipped with dual target positions and dual RF power supplies, supporting independent or combined deposition of two different target materials. It is suitable for R&D of metal oxides, nitrides, dielectric films, semiconductor films, transparent conductive films, sensor functional layers, electrode layers, and multilayer composite films.

Happy Dragon Boat Festival. May innovation continue to drive discovery.

In the field of semiconductor thin-film fabrication, one phenomenon often appears in university laboratories, research institutes, and corporate R&D centers.

After a new high-vacuum magnetron sputtering system is installed, engineers and researchers usually do not start by fabricating the most complex device structures. Instead, they often begin with a seemingly ordinary material: copper (Cu).

Low-Vacuum Coating Systems – An Ideal Choice for Research and Teaching

Explore the microscopic world of materials science with the VPI SD-650 Series High Vacuum Magnetron Sputtering System, delivering precise and controllable thin film deposition. Operating in a stable high-vacuum environment, it enables the deposition of metals, oxides, and non-metallic films, meeting the diverse needs of both research and industrial applications.

The VPI SD-2000III is a low vacuum triple-target rotating magnetron sputtering coater designed for thin film deposition, sample preparation, and surface engineering applications. Equipped with a triple-target rotating structure, the system supports rapid target switching and continuous coating processes, making it suitable for multilayer and composite film deposition.

Featuring an optimized magnetron design, the system delivers consistent coating quality across various applications. It is easy to operate with intuitive parameter control, making it suitable even for beginners.

VPI recently delivered a high vacuum magnetron sputtering system for semiconductor capacitor electrode fabrication, featuring a single-target dual power supply and integrated film thickness monitoring. The system enables stable vacuum conditions and precise deposition control, ensuring high film uniformity and repeatability.

This project highlights VPI’s capabilities in high vacuum coating solutions, engineering delivery, and thin film process support for semiconductor and advanced materials applications.

Recently, the VPI engineering team successfully completed the on-site installation, commissioning, and training of a High Vacuum SD-650MH Coating System at NCS Testing Technology. The successful implementation of this project once again demonstrates VPI’s professional delivery capabilities in high-vacuum thin film deposition equipment, while further highlighting the company’s extensive service experience across research platforms, testing institutions, and advanced laboratory applications.

Turning Non-standard Processes into Controlled Workflows

From a Small Control Board to a Custom Vacuum System

May the New Year bring you success in your career and research, prosperous cooperation, and happiness and health for you and your family.

Recently, VPI’s application engineering team visited the School of Chemical Engineering at Changchun University of Technology to conduct a routine follow-up and technical maintenance of the high-vacuum and low-vacuum coating systems currently in operation.

The 2026 New Year calendar and beautifully designed bookmarks have been prepared as a token of VPI’s appreciation for our long-term partnership and trust.

Happy Holidays from VPI, and best wishes for a smooth and successful 2026!

VPI SD-650MHT High-Vacuum Dual-Target Magnetron Sputtering System Successfully Deployed at the Materials Science Laboratory of Heilongjiang University of Science and Technology

We are excited to announce that the VPI 2026 calendar is ready for distribution!

By optimizing the target-to-sample distance, power, pressure, and other parameters, it is possible to effectively balance sputtering rate and effective sputtered area. For VPI equipment, adjusting these variables based on sample size, quantity, and deposition thickness will lead to more efficient and higher-quality thin film deposition.

As a mid-to-high-end deposition system designed for materials science applications, the SD-650MHT is well-suited for research in metal surface engineering, functional oxide films, and emerging electronic materials. The system supports both DC and RF sputtering, enabling the deposition of high-quality thin films on a variety of substrates including metals, ceramics, semiconductors, and insulators. It provides critical support for research projects involving conductive layers, dielectric films, and multilayer structures.