Часто задаваемые вопросы
8 июн. 2026 г.
Why Do Semiconductor Laboratories Often Start by Sputtering a Layer of Copper?Process Logic Behind Metal Seed Layers, Seen Through a Set of VPI Cu Thin-Film Experiments
In the field of semiconductor thin-film fabrication, one phenomenon often appears in university laboratories, research institutes, and corporate R&D centers.
After a new high-vacuum magnetron sputtering system is installed, engineers and researchers usually do not start by fabricating the most complex device structures. Instead, they often begin with a seemingly ordinary material: copper (Cu).
15 мая 2026 г.
VPI SD-650 Series High Vacuum Magnetron Sputtering System
Explore the microscopic world of materials science with the VPI SD-650 Series High Vacuum Magnetron Sputtering System, delivering precise and controllable thin film deposition. Operating in a stable high-vacuum environment, it enables the deposition of metals, oxides, and non-metallic films, meeting the diverse needs of both research and industrial applications.
8 мая 2026 г.
VPI SD-2000III Low Vacuum Triple-Target Rotating Magnetron Sputtering Coater
The VPI SD-2000III is a low vacuum triple-target rotating magnetron sputtering coater designed for thin film deposition, sample preparation, and surface engineering applications. Equipped with a triple-target rotating structure, the system supports rapid target switching and continuous coating processes, making it suitable for multilayer and composite film deposition.
24 апр. 2026 г.
Stable Discharge, Easy Coating — VPI SD-920M Low Vacuum Magnetron Sputtering System
Featuring an optimized magnetron design, the system delivers consistent coating quality across various applications. It is easy to operate with intuitive parameter control, making it suitable even for beginners.
20 апр. 2026 г.
VPI High Vacuum Coating System Applied in Capacitor Electrode Fabrication, Enhancing Process Stability in Semiconductor Materials
VPI recently delivered a high vacuum magnetron sputtering system for semiconductor capacitor electrode fabrication, featuring a single-target dual power supply and integrated film thickness monitoring. The system enables stable vacuum conditions and precise deposition control, ensuring high film uniformity and repeatability.
This project highlights VPI’s capabilities in high vacuum coating solutions, engineering delivery, and thin film process support for semiconductor and advanced materials applications.
7 апр. 2026 г.
VPI Successfully Delivers High Vacuum SD-650MH Coating System to NCS Testing Technology, Supporting Surface Analysis and Thin Film Applications
Recently, the VPI engineering team successfully completed the on-site installation, commissioning, and training of a High Vacuum SD-650MH Coating System at NCS Testing Technology. The successful implementation of this project once again demonstrates VPI’s professional delivery capabilities in high-vacuum thin film deposition equipment, while further highlighting the company’s extensive service experience across research platforms, testing institutions, and advanced laboratory applications.
12 янв. 2026 г.
Customer Visit: School of Chemical Engineering, Changchun University of Technology
Recently, VPI’s application engineering team visited the School of Chemical Engineering at Changchun University of Technology to conduct a routine follow-up and technical maintenance of the high-vacuum and low-vacuum coating systems currently in operation.
22 дек. 2025 г.
VPI SD-650MHT High-Vacuum Dual-Target Magnetron Sputtering System Successfully Deployed at the Materials Science Laboratory of Heilongjiang University of Science and Technology
VPI SD-650MHT High-Vacuum Dual-Target Magnetron Sputtering System Successfully Deployed at the Materials Science Laboratory of Heilongjiang University of Science and Technology
24 нояб. 2025 г.
Optimizing Sputtering Technology: How to Enhance Effective Sputtered Area and Sputtering Rate
By optimizing the target-to-sample distance, power, pressure, and other parameters, it is possible to effectively balance sputtering rate and effective sputtered area. For VPI equipment, adjusting these variables based on sample size, quantity, and deposition thickness will lead to more efficient and higher-quality thin film deposition.
10 нояб. 2025 г.
Northeastern University Installs VPI SD-650MHT Dual-Target High-Vacuum Sputtering System to Advance Materials Science Research
As a mid-to-high-end deposition system designed for materials science applications, the SD-650MHT is well-suited for research in metal surface engineering, functional oxide films, and emerging electronic materials. The system supports both DC and RF sputtering, enabling the deposition of high-quality thin films on a variety of substrates including metals, ceramics, semiconductors, and insulators. It provides critical support for research projects involving conductive layers, dielectric films, and multilayer structures.
27 окт. 2025 г.
VPI High Vacuum Magnetron Sputtering System Installed in the Shared Laboratory of the School of Physics and Astronomy, Shanghai Jiao Tong University
VPI High Vacuum Magnetron Sputtering System Installed in the Shared Laboratory of the School of Physics and Astronomy, Shanghai Jiao Tong University
13 окт. 2025 г.
20 Years of Dedication — Only for the Best
Founded in 2004, VPI (Vision Precision Instruments) has spent the past two decades building a legacy of trust and excellence in the global vacuum coating industry. From world-leading research institutions to cutting-edge technology companies, users around the world continue to achieve breakthroughs with the help of VPI’s precision coating systems. This enduring pursuit of excellence reflects VPI’s brand philosophy — “Only for the Best.” For twenty years, VPI has crafted every instrument with precision and passion, committed to delivering a better experience and superior results for every customer.
28 сент. 2025 г.
Revisiting Shanghai Jiao Tong University Shared Laboratory: Technical Exchange and Service
Recently, a team of application engineers from VPI visited the Shared Laboratory of Shanghai Jiao Tong University. The purpose of this visit was to gain insights into the real-world performance of the SD-650 series high-vacuum magnetron sputtering systems, to collect feedback and suggestions from users, and to strengthen long-term collaboration with academic research teams.
15 сент. 2025 г.
Sputter Coaters in Electron‑Microscopy Sample Preparation: The First Step into the Microscopic World
When imaging the microscopic world with a scanning electron microscope (SEM), sample preparation is a decisive factor for image quality. Among the tools working behind the scenes, the sputter coater plays a crucial role. By depositing an ultrathin metallic coating on a specimen, it improves conductivity and optimizes imaging. This article explains what a sputter coater is, why it matters in electron microscopy (EM) sample preparation, and where it is commonly used.


















